Introduction to the job

We are looking for highly motivated, self-driven, hands-on technical individual to support our state-of-the-art Optical Proximity Correction product (OPC +) for Memory process. This position will be in ASML Brion Korea FAE(Field Application Engnieeer) organization.

Role and responsibilities

?This position will focus primarily on the development of mask OPC flows and solutions for patterning processes. ?Define the details of new OPC product features and improvements in each release. ?Provides an opportunity to help define and support the development of enabling RET/OPC capabilities for next-generation lithography processes. ?With robust solutions(building recipe, parameter optimization), make customer use Brion’s products without any problems. ?By introducing new features of products to customer, drive customer to adopt Brion products as a baseline solution. ?By in-depth investigation for product features, finding bugs and propose new features to enhance product performance. ?By technical communication with customer and Brion US headquarter, find the best solution to support customer

Education and experience

?BSEE, MSEE/ MS or Ph.D. Physics, Physical Chemistry, Electrical Engineering, or Computer Science required ?Or Minimum of 5 years’ experience in process engineering or process development in a manufacturing environment. ?Direct experience in OPC (Optical Proximity Correction), including lithography simulation, ILT, RET, DRC, DFM/LFD, or advanced mask technology is a plus. ? Experience with lithography and related metrology processes. (신입 : 석사 이상, 경력 : 학사 및 5년 이상의 경력)

Skills

?Analytical skills for evaluating information carefully and solving complex problems ?Demonstrated project leadership skills including project planning, risk assessment and mitigation, and meeting aggressive schedules. ?Strong problem analysis/solving and innovative thinking skills. ?Ability to work independently and also effectively as a member of a team. ?Programming languages in one of following ? C/C++, Python, MatLap, Perl, Lua ?Good communication skills, verbal and written, both in English

Preferred 

?Knowledge of OPC models/LMC ?Direct experience with Photolithography and/or OPC model development ?Experience with design rules (DRC), DFM/LFD ?Individuals with strong ability to learn and explore new technologies and who are able to demonstrate good analysis and problem-solving skills are preferred

Other information * Working Location : Hwasung, Gyunggi-Do

Other information

* Working Location : Hwasung